Netherlands·Buyer: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOMetrology SEM+FIB system
The main purpose of this FIB/SEM equipment is to perform material milling (cutting), 3D characterization, and cross section analysis of epitaxially grown InP, InGaAs, InAlGaAs and InGaAsP layers on InP substrates. The structures may also contain polymer-based planarization layers, SiOx or SiNx dielectric layers and TiPtAu or NiGeAu metal layers.
Deadline
07.09.2026
Published
03.11.2026
Awarded
03.11.2026
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