Netherlands·Buyer: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO

Metrology SEM+FIB system

Closed·28 Jul 2026

The main purpose of this FIB/SEM equipment is to perform material milling (cutting), 3D characterization, and cross section analysis of epitaxially grown InP, InGaAs, InAlGaAs and InGaAsP layers on InP substrates. The structures may also contain polymer-based planarization layers, SiOx or SiNx dielectric layers and TiPtAu or NiGeAu metal layers.

Published

28.07.2026

Open for bids

28.07.2026

Conditions updated

28.07.2026

Deadline

07.09.2026

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